A photolithographic process for fabrication of devices with isolated single-walled carbon nanotubes

Alexander Tselev, Kyle Hatton, Michael S. Fuhrer, Makarand Paranjape, Paola Barbara

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34 Citations (Scopus)


We have successfully fabricated devices with isolated single-walled carbon nanotubes (SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were patterned with an SU-8-photoresist-based process. This method provides well-defined islands, down to 1 μm in size. The islands are clearly visible with an optical microscope and are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by standard photolithography.

Original languageEnglish
Pages (from-to)1475-1478
Number of pages4
Issue number11
Publication statusPublished - 1 Nov 2004
Externally publishedYes

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