A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography

Wei Shen; Brenda Hutton; Fuping Liu

A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography

Wei Shen, Brenda Hutton, Fuping Liu

Chemical Engineering

Research output: Contribution to journal › Article › Research › peer-review

Original language	English
Pages (from-to)	1861 - 1887
Number of pages	27
Journal	Journal of Adhesion Science and Technology
Volume	18
Issue number	15-16
Publication status	Published - 2004

Cite this

@article{c4676a51bec64a81bb1424f8f2f0c38a,

title = "A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography",

author = "Wei Shen and Brenda Hutton and Fuping Liu",

year = "2004",

language = "English",

volume = "18",

pages = "1861 -- 1887",

journal = "Journal of Adhesion Science and Technology",

issn = "0169-4243",

publisher = "Taylor & Francis",

number = "15-16",

}

TY - JOUR

T1 - A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography

AU - Shen, Wei

AU - Hutton, Brenda

AU - Liu, Fuping

PY - 2004

Y1 - 2004

M3 - Article

VL - 18

SP - 1861

EP - 1887

JO - Journal of Adhesion Science and Technology

JF - Journal of Adhesion Science and Technology

SN - 0169-4243

IS - 15-16

ER -