A new model silicon/silicon oxide interface synthesized from H10Si10O15 and Si(100)-2×1

K. Z. Zhang; Leah M. Meeuwenberg; Mark M.Banaszak Holl; F. R. Mcfeely

doi:10.1143/JJAP.36.1622

A new model silicon/silicon oxide interface synthesized from H₁₀Si₁₀O₁₅ and Si(100)-2×1

K. Z. Zhang, Leah M. Meeuwenberg, Mark M.Banaszak Holl, F. R. Mcfeely

Research output: Contribution to journal › Article › Research › peer-review

15 Citations (Scopus)

Abstract

A model silicon/silicon oxide interface, synthesized from the spherosiloxane H₁₀Si₁₀O₁₅ and Si(100)-2×1, has been characterized by study of the Si 2p core-levels and valence band region using soft X-ray photoemission. In addition, the intact H₁₀Si₁₀O₁₅ cluster was condensed at - 160°C onto Si(111)-H and characterized. The measured photoemission features are in good agreement with the results of previous model studies.

Original language	English
Pages (from-to)	1622-1626
Number of pages	5
Journal	Japanese Journal of Applied Physics
Volume	36
Issue number	3S
DOIs	https://doi.org/10.1143/JJAP.36.1622
Publication status	Published - 1 Mar 1997
Externally published	Yes

Keywords

SiO/Si interface
Spherosiloxane
X-ray photoemission

Access to Document

10.1143/JJAP.36.1622

Cite this

@article{937b51e66c304f968c23b7c89a2f45cb,

title = "A new model silicon/silicon oxide interface synthesized from H10Si10O15 and Si(100)-2×1",

abstract = "A model silicon/silicon oxide interface, synthesized from the spherosiloxane H10Si10O15 and Si(100)-2×1, has been characterized by study of the Si 2p core-levels and valence band region using soft X-ray photoemission. In addition, the intact H10Si10O15 cluster was condensed at - 160°C onto Si(111)-H and characterized. The measured photoemission features are in good agreement with the results of previous model studies.",

keywords = "SiO/Si interface, Spherosiloxane, X-ray photoemission",

author = "Zhang, \{K. Z.\} and Meeuwenberg, \{Leah M.\} and Holl, \{Mark M.Banaszak\} and Mcfeely, \{F. R.\}",

year = "1997",

month = mar,

day = "1",

doi = "10.1143/JJAP.36.1622",

language = "English",

volume = "36",

pages = "1622--1626",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "IOP Publishing",

number = "3S",

}

TY - JOUR

T1 - A new model silicon/silicon oxide interface synthesized from H10Si10O15 and Si(100)-2×1

AU - Zhang, K. Z.

AU - Meeuwenberg, Leah M.

AU - Holl, Mark M.Banaszak

AU - Mcfeely, F. R.

PY - 1997/3/1

Y1 - 1997/3/1

N2 - A model silicon/silicon oxide interface, synthesized from the spherosiloxane H10Si10O15 and Si(100)-2×1, has been characterized by study of the Si 2p core-levels and valence band region using soft X-ray photoemission. In addition, the intact H10Si10O15 cluster was condensed at - 160°C onto Si(111)-H and characterized. The measured photoemission features are in good agreement with the results of previous model studies.

AB - A model silicon/silicon oxide interface, synthesized from the spherosiloxane H10Si10O15 and Si(100)-2×1, has been characterized by study of the Si 2p core-levels and valence band region using soft X-ray photoemission. In addition, the intact H10Si10O15 cluster was condensed at - 160°C onto Si(111)-H and characterized. The measured photoemission features are in good agreement with the results of previous model studies.

KW - SiO/Si interface

KW - Spherosiloxane

KW - X-ray photoemission

UR - https://www.scopus.com/pages/publications/0011748705

U2 - 10.1143/JJAP.36.1622

DO - 10.1143/JJAP.36.1622

M3 - Article

AN - SCOPUS:0011748705

SN - 0021-4922

VL - 36

SP - 1622

EP - 1626

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 3S