3D patterning by means of nanoimprinting, X-ray and two-photon lithography

Massimo Tormen, Luca Businaro, Matteo Altissimo, Filippo Romanato, Stefano Cabrini, Frederic Perennes, R Proietti, Hong-Bo Sun, Satoshi Kawata, Enzo Di Fabrizio

Research output: Contribution to journalArticleResearchpeer-review

64 Citations (Scopus)

Abstract

Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.
Original languageEnglish
Pages (from-to)535 - 541
Number of pages7
JournalMicroelectronic Engineering
Volume73
DOIs
Publication statusPublished - 2004

Cite this

Tormen, M., Businaro, L., Altissimo, M., Romanato, F., Cabrini, S., Perennes, F., ... Di Fabrizio, E. (2004). 3D patterning by means of nanoimprinting, X-ray and two-photon lithography. Microelectronic Engineering, 73, 535 - 541. https://doi.org/10.1016/j.mee.2004.02.081
Tormen, Massimo ; Businaro, Luca ; Altissimo, Matteo ; Romanato, Filippo ; Cabrini, Stefano ; Perennes, Frederic ; Proietti, R ; Sun, Hong-Bo ; Kawata, Satoshi ; Di Fabrizio, Enzo. / 3D patterning by means of nanoimprinting, X-ray and two-photon lithography. In: Microelectronic Engineering. 2004 ; Vol. 73. pp. 535 - 541.
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abstract = "Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.",
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Tormen, M, Businaro, L, Altissimo, M, Romanato, F, Cabrini, S, Perennes, F, Proietti, R, Sun, H-B, Kawata, S & Di Fabrizio, E 2004, '3D patterning by means of nanoimprinting, X-ray and two-photon lithography', Microelectronic Engineering, vol. 73, pp. 535 - 541. https://doi.org/10.1016/j.mee.2004.02.081

3D patterning by means of nanoimprinting, X-ray and two-photon lithography. / Tormen, Massimo; Businaro, Luca; Altissimo, Matteo; Romanato, Filippo; Cabrini, Stefano; Perennes, Frederic; Proietti, R; Sun, Hong-Bo; Kawata, Satoshi; Di Fabrizio, Enzo.

In: Microelectronic Engineering, Vol. 73, 2004, p. 535 - 541.

Research output: Contribution to journalArticleResearchpeer-review

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AU - Tormen, Massimo

AU - Businaro, Luca

AU - Altissimo, Matteo

AU - Romanato, Filippo

AU - Cabrini, Stefano

AU - Perennes, Frederic

AU - Proietti, R

AU - Sun, Hong-Bo

AU - Kawata, Satoshi

AU - Di Fabrizio, Enzo

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AB - Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.

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Tormen M, Businaro L, Altissimo M, Romanato F, Cabrini S, Perennes F et al. 3D patterning by means of nanoimprinting, X-ray and two-photon lithography. Microelectronic Engineering. 2004;73:535 - 541. https://doi.org/10.1016/j.mee.2004.02.081