3D patterning by means of nanoimprinting, X-ray and two-photon lithography

Massimo Tormen; Luca Businaro; Matteo Altissimo; Filippo Romanato; Stefano Cabrini; Frederic Perennes; R Proietti; Hong-Bo Sun; Satoshi Kawata; Enzo Di Fabrizio

doi:10.1016/j.mee.2004.02.081

3D patterning by means of nanoimprinting, X-ray and two-photon lithography

Massimo Tormen, Luca Businaro, Matteo Altissimo, Filippo Romanato, Stefano Cabrini, Frederic Perennes, R Proietti, Hong-Bo Sun, Satoshi Kawata, Enzo Di Fabrizio

Melbourne Centre for Nanofabrication

Research output: Contribution to journal › Article › Research › peer-review

79 Citations (Scopus)

Abstract

Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.

Original language	English
Pages (from-to)	535 - 541
Number of pages	7
Journal	Microelectronic Engineering
Volume	73
DOIs	https://doi.org/10.1016/j.mee.2004.02.081
Publication status	Published - 2004

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10.1016/j.mee.2004.02.081

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title = "3D patterning by means of nanoimprinting, X-ray and two-photon lithography",

abstract = "Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.",

author = "Massimo Tormen and Luca Businaro and Matteo Altissimo and Filippo Romanato and Stefano Cabrini and Frederic Perennes and R Proietti and Hong-Bo Sun and Satoshi Kawata and {Di Fabrizio}, Enzo",

year = "2004",

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language = "English",

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journal = "Microelectronic Engineering",

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T1 - 3D patterning by means of nanoimprinting, X-ray and two-photon lithography

AU - Tormen, Massimo

AU - Businaro, Luca

AU - Altissimo, Matteo

AU - Romanato, Filippo

AU - Cabrini, Stefano

AU - Perennes, Frederic

AU - Proietti, R

AU - Sun, Hong-Bo

AU - Kawata, Satoshi

AU - Di Fabrizio, Enzo

PY - 2004

Y1 - 2004

N2 - Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.

AB - Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersectionstructure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.

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U2 - 10.1016/j.mee.2004.02.081

DO - 10.1016/j.mee.2004.02.081

M3 - Article

SN - 0167-9317

VL - 73

SP - 535

EP - 541

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

3D patterning by means of nanoimprinting, X-ray and two-photon lithography

Abstract

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